Automated Defect Inspection for Semiconductor Wafers: Capable of defect detection, point re-inspection, and optional double-side fully automated inspection.

Multi-Site Inspection Support: Suitable for various process stages such as lithography, etching, and final product shipment.

Flexible Micro and Macro Inspection Modes: Offers both auto and manual modes, with configurable inspection workflows for flexibility.

Five-Hole Microscope Turret:Supports objective lenses from 5X to 150X for versatile magnification.

High-Performance Light Sources: Each inspection station provides rich, high-performance light sources, supporting both bright-field and dark-field imaging in micro and macro modes.

Flexible Function Customization: The system can be customized with full or partial features, offering flexibility in configuration.

Macro Auto Inspection: Front and back-side automatic macro inspection with selectable magnification options (0.25X/0.5X/1X).

Micro Inspection with Advanced Features: Supports the loading of pre-processing KLARF files, enabling up to 150X micro inspection.

Key Features

1.  with 8/12-inch wafers.

2. Front and back-side macro inspection (0.25X/0.5X/1X magnification options).

3. Supports both automatic and manual modes (including KLARF auto review).

4. Manual Inspection at Any Angle: Supports both manual and automatic photography modes (preset inspection points with automatic capture).

5. All inspection stations support BD/DF light sources.

6. Automatic Microscope Focusing

7. Up to 100X magnification for high-resolution micro inspection.

8. Supports wafer edge and back-side adsorption options.

9. Compatible with Si, SiC, GaN, GaAs, InP, Sapphire, and more.

10. Supports various inspection requirements including ADI, AEI, API, and OQI.